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RISD textiles MFA candidates hosting NYC reception, viewing

Providence, R.I. – A dozen masters students from the Rhode Island School of Design’s [RISD] Textile Department will present selections of their work at a public event at New York Design Center on June 5 from 5:30 p.m. to 8 p.m.

New York Design Center is located at 200 Lexington Ave., and the young designers will be present to discuss their work.

The one-day showcase highlights work that began last fall guided by Sherri Donghia, executive vp of Donghia, Inc., within her project entitled “New Materials.” With her background in both fashion and interiors, Donghia guided the graduate students in innovative and applicable design solutions.

The work ranges from apparel to interior fabrics – some produced by hand, some designed as prototypes for industrial production.

The event is open to the public.

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